AST-S300

Single Wafer PR Stripper

Wet type PR striper system for 6/8/12 inch thick film photo resistance striper system for 6/8/12 inch thick film resistance. Based on spin function, the machine also has SUI clean function to remove the most difficult resistance layer.

Features
  • Process uniformity is available to adjust with recipe;
  • Single wafer conditions can be controllable and traceability;
  • Process parameter is easy to adjust.
  • SUI tank, soften thick film resistance.
  • Better safety than bench type.
  • Cleanliness control better than batch method;
  • Small footprint
  • Suitable for wafer dry in/ dry out process

Cleaning the thick film photoresist of various wafers and removing the photoresist of metal lift off process

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Single Wafer PR Stripper
Wet type PR striper system for 6/8/12 inch thick film photo resistance striper system for 6/8/12 inch thick film resista ...
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