AST-S300
Single Wafer PR Stripper
Wet type PR striper system for 6/8/12 inch thick film photo resistance striper system for 6/8/12 inch thick film resistance. Based on spin function, the machine also has SUI clean function to remove the most difficult resistance layer.
Features
- Process uniformity is available to adjust with recipe;
- Single wafer conditions can be controllable and traceability;
- Process parameter is easy to adjust.
- SUI tank, soften thick film resistance.
- Better safety than bench type.
- Cleanliness control better than batch method;
- Small footprint
- Suitable for wafer dry in/ dry out process
Cleaning the thick film photoresist of various wafers and removing the photoresist of metal lift off process