CPC-600
Centrifugal Cleaner
CPC-600 ：
High Cleanliness system；
High pressure -----Two Fluid-----Centrifugal dry；
---－－Wafer, CMOS, Holder, Holder+IR,
LCD, VCM , CCD： Particle，Dust...
High Cleanliness system；
High pressure -----Two Fluid-----Centrifugal dry；
---－－Wafer, CMOS, Holder, Holder+IR,
LCD, VCM , CCD： Particle，Dust...
Features
Wafer
Holder
Filter
CMOS(COB&CSP)
LCD
CCD
Specification
| Technical Parameters | |
|---|---|
| Water Plate | Φ 600mm |
| Max Size | 200mm(L)×140mm(W) |
| Cleaning Type | High Pressure+two fluid cleaning |
| Dry model | High speed centrifugal rotary |
| Rotary speed | 0--2840 r/min |
| Pressure release | 1.5—13.8kg |
| Filter precision | 0.1UM |
| Air filter precision | 0.01UM |
| Particle clean ability | ≧1um 98% |
| Equipment material | 316 SUS |
| Pressure | >2.0Kgf |
| Water fluid range | ＜10.8L/min |
| DI water requirement | >16MΩ |
| CDR requirement | 0.45—0.7mpa |
| CDR cleanliness requirement | 0.01um/99.5% above, oil less than＜0.1ppm |
| CDR consumption | Two fluid cleaning:＜100L/min |
| Air outlet capacity | 5.0m³/min |
| Control Model | PLC+touch screen |
| Power supply | 380V 10A 50HZ |
| Weight | 480kg |
| Size | 870mm(L)X1000mm(W)X1750mm(H) |
